Columnar crystalline silicon | Si material for semiconductor devices
Achieving both interposer-free and large-scale compatibility, while solving processing and process challenges of Si materials.
Do you have concerns about the design and manufacturing of semiconductor device components that need to accommodate large and complex shapes while also reducing chipping and cracking during processing? Our columnar crystalline silicon is a material characterized by being free of inclusions, high strength, and a unique crystal structure. It has processability and plasma etching characteristics equivalent to single crystal silicon, contributing to the reduction of processing defects and material-related issues. Additionally, we can accommodate round shapes up to a maximum diameter of 700mm and square shapes up to a maximum size of 1200mm, supporting greater design flexibility for large and complex shaped components. Furthermore, with a purity of 6N and being free of inclusions, we can expect a reduction in risks of abnormal discharge, particles, and metal contamination. This contributes to improved processing yield, increased equipment operating rates, and reduced maintenance burdens. We support the development of various silicon parts for plasma etching equipment, including retaining rings, susceptors, and transport hands. For more details, please check the Mitsubishi Materials official website and consult us through the inquiry form.
